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News / Publications

Press Releases

• New NIR Spectrograph

Presentations

Endpoint Detection – Optical Emission Spectroscopy (OES)

• Endpoint Detection of Low Open Area Contact Etches from Optical Emission Spectroscopy Measurements [PDF]
• Use of Spectrograph-based OES for SiN Etch Selectivity and Endpoint Optimization [PDF]

Endpoint Detection – Interferometric (IEP)

• In-Situ UV-Visible Reflectometry for STI, Recess and Gate Etch Endpoint [PDF]

Film Thickness Measurement

• Heterodyne Reflectometry for Angstroms-thick Thin Films [Request Pub]
• Large Spot Reflectometry for CVD Process Control [PDF]

Process Monitoring

• Stable OES System for Fault Detection and Process Monitoring [PDF]
• Method for Real Time Monitoring of Gas Composition with High Sensitivity using Optical Emission Spectroscopy [PDF]

Other

• Novel Macro Inspection Tool for Integrated ADI [Request Pub]
• Migration of Intelligent Autonomy into Embedded Instrumentation for the Optimization of Process Monitoring and Control [Request Pub]
• Integration Effectiveness of In Situ Optical Metrology for CMP [PDF]

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