Publications Endpoint Detection – Optical Emission Spectroscopy (OES) Endpoint Detection of Low Open Area Contact Etches from Optical Emission Spectroscopy Measurements (PDF) Use of Spectrometer-based OES for SiN Etch Selectivity and Endpoint Optimization (PDF) Endpoint Detection – Interferometric (IEP) In-Site UV-Visible Reflectometry for STL Recess and Gate Etch Endpoint (PDF) Film Thickness Measurement Heterodyne Reflectometry for Angstroms-thick Thin Films (PDF) Large Spot Reflectometry for CVD Process Control (PDF) Process Monitoring Stable OES System for Fault Detection and Process Monitoring (PDF) Method for Real Time Monitoring of Gas Composition with High Sensitivity using Optical Emission Spectroscopy (PDF) Other Novel Macro Inspection Tool for Integrated ADI (PDF) Migration of Intelligent Autonomy into Embedded Instrumentation for the Optimization of Process Monitoring and Control (PDF) Integration Effectiveness of In Site Optical Metrology for CMP (PDF)