Publications

Endpoint Detection – Optical Emission Spectroscopy (OES)

• Endpoint Detection of Low Open Area Contact Etches from Optical Emission Spectroscopy Measurements (PDF)
• Use of Spectrometer-based OES for SiN Etch Selectivity and Endpoint Optimization (PDF)

Endpoint Detection – Interferometric (IEP)

• In-Site UV-Visible Reflectometry for STL Recess and Gate Etch Endpoint (PDF)

Film Thickness Measurement

• Heterodyne Reflectometry for Angstroms-thick Thin Films (PDF)
• Large Spot Reflectometry for CVD Process Control (PDF)

Process Monitoring

• Stable OES System for Fault Detection and Process Monitoring (PDF)
• Method for Real Time Monitoring of Gas Composition with High Sensitivity using Optical Emission Spectroscopy (PDF)

Other

• Novel Macro Inspection Tool for Integrated ADI (PDF)
• Migration of Intelligent Autonomy into Embedded Instrumentation for the Optimization of Process Monitoring and Control (PDF)
• Integration Effectiveness of In Site Optical Metrology for CMP (PDF)